Low cost wafer metrology using a NIR low coherence interferometry

Collection with item attached
2013
Item details URL
http://open-repository.kisti.re.kr/cube/handle/open_repository/481363.do
DOI
10.1364/OE.21.013648
Title
Low cost wafer metrology using a NIR low coherence interferometry
Description
This research was supported by Basic Science Research Program throughthe National Research Foundation of Korea (NRF) funded by the Ministryof Education, Science and Technology (2012R1A1A1001842)
abstract
In this investigation, a low cost Si wafer metrology system based on low coherence interferometry using NIR light is proposed and verified. The whole system consists of two low coherence interferometric principles: low coherence scanning interferometry (LCSI) for measuring surface profiles and spectrally-resolved interferometry (SRI) to obtain the nominal optical thickness of the double-sided polished Si wafer. The combination of two techniques can reduce the measurement time and give adequate dimensional information of the Si wafer. The wavelength of the optical source is around 1 mu m, for which transmission is non-zero for undoped silicon and can be also detected by a typical CCD camera. Because of the typical CCD camera, the whole system can be constructed inexpensively. (C) 2013 Optical Society of America
provenance
Made available in Cube on 2018-09-28T13:50:53Z (GMT). No. of bitstreams: 0
language
English
author
Kim, Young Gwang
Seo, Yong Bum
Joo, Ki-Nam
accessioned
2018-09-28T13:50:53Z
available
2018-09-28T13:50:53Z
issued
2013
citation
OPTICS EXPRESS(21): 11
issn
1094-4087
uri
http://open-repository.kisti.re.kr/cube/handle/open_repository/481363.do
Funder
미래창조과학부
Funding Program
일반연구자지원(미래부)
Project ID
9991005173
Jurisdiction
Rep.of Korea
Project Name
Precision metrology based on widely spaced optical comb
rights
openAccess
type
article


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