Adhesion and Self-Healing between Monolayer Molybdenum Disulfide andSilicon Oxide

Collection with item attached
2017
Item details URL
http://open-repository.kisti.re.kr/cube/handle/open_repository/474321.do
DOI
10.1038/s41598-017-14921-9
Title
Adhesion and Self-Healing between Monolayer Molybdenum Disulfide andSilicon Oxide
Description
Work at Sungkyunkwan University was supported by the Nano.MaterialTechnology Development Program (No. 2016M3A7B4900121) through theNational Research Foundation of Korea (NRF) funded by the Ministry ofEducation, Science and Technology and the Nuclear Energy ResearchInfrastructure Program (No. 2017M2B2A9A02049912) through the NRF fundedby the Ministry of Science and ICT. It was also supported by the BasicScience Research Program (No. 2014R1A1A1004818 and No. 2017R1C1B2010278)and the Convergence Technology Development Program for Bionic Arm (No.2014M3C1B2048175) through the NRF funded by the Ministry of Science, ICTand Future Planning. Partial work at Sungkyunkwan University was alsosupported by the Global Frontier Research Center for Advanced SoftElectronics (2011-0031630) through a NRF Grant funded by the Ministry ofScience, ICT and Future Planning. Work at the University of Texas atAustin was supported by the National Science Foundation (NSF) throughGrant No. CMMI-1130261 and Cooperative Agreement No. EEC-1160494. Anyopinions, findings and conclusions or recommendations expressed in thismaterial are those of the authors and do not necessarily reflect theviews of the NRF and NSF.
abstract
The adhesion interactions of two-dimensional (2D) materials are of importance in developing flexible electronic devices due to relatively large surface forces. Here, we investigated the adhesion properties of large-area monolayer MoS2 grown on silicon oxide by using chemical vapor deposition. Fracture mechanics concepts using double cantilever beam configuration were used to characterize the adhesion interaction between MoS2 and silicon oxide. While the interface between MoS2 and silicon oxide was fractured under displacement control, force-displacement response was recorded. The separation energy, adhesion strength and range of the interactions between MoS2 and silicon oxide were characterized by analytical and numerical analyses. In addition to the fundamental adhesion properties of MoS2, we found that MoS2 monolayers on silicon oxide had self-healing properties, meaning that when the separated MoS2 and silicon oxide were brought into contact, the interface healed. The self-healing property of MoS2 is potentially applicable to the development of new composites or devices using 2D materials.
provenance
Made available in Cube on 2018-09-28T10:42:56Z (GMT). No. of bitstreams: 0
language
English
author
Na, Seung Ryul
Kim, Youngchan
Lee, Changgu
Liechti, Kenneth M.
Suk, Ji Won
orcid
Suk, Ji Won/0000-0002-3953-6617
accessioned
2018-09-28T10:42:56Z
available
2018-09-28T10:42:56Z
issued
2017
citation
SCIENTIFIC REPORTS(7)
issn
2045-2322
uri
http://open-repository.kisti.re.kr/cube/handle/open_repository/474321.do
Funder
교육부
Funding Program
BK21플러스사업(0.5)
Project ID
1345274016
Jurisdiction
Rep.of Korea
Project Name
HRD Center for Human-Friendly Convergence System
rights
openAccess
type
article


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